We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for CVD Equipment.
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CVD Equipment Product List and Ranking from 4 Manufacturers, Suppliers and Companies | IPROS GMS

CVD Equipment Product List

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DLI-CVD/DLI-ALD device "MC-050"

DLI-CVD/DLI-ALD device "MC-050"

Due to lamp heating, RTP and RTCVD processing is possible! Quartz tube-type chamber.

The MC-050 is a DLI-CVD/DLI-ALD system compatible with substrates up to 50mm in diameter. The maximum film formation temperature is 1100°C (lamp heating method), and it can accommodate up to 6 DLI evaporators. Additionally, it can have a maximum of 8 mass flow controllers and is equipped with a turbo pump. Please feel free to contact us for inquiries. 【Features】 ■ Compatible with substrates up to 50mm in diameter ■ Maximum film formation temperature: 1100°C (lamp heating method) ■ Can accommodate up to 6 DLI evaporators ■ Mass flow controllers: up to 8 ■ Quartz tube-type chamber *For more details, please refer to the PDF document or feel free to contact us.

  • Annealing furnace
  • CVD Equipment

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CVD equipment

CVD equipment

Achieving excellent film thickness distribution and reproducibility! Multi-chamber specifications and various custom-made options are also available.

We would like to introduce the "CVD equipment" that we handle. Starting with the "Oxide/Nitride Plasma CVD Equipment," which achieves low stress, high hardness, and high insulation through a two-frequency independent application method, we also offer a lineup that includes "DLC Coating Equipment" and "Carbon Nanotube Synthesis Equipment." We can also manufacture multi-chamber specifications and various custom orders. Please feel free to contact us when needed. 【Features of Oxide/Nitride Plasma CVD Equipment】 ■ Achieves excellent film thickness distribution and reproducibility ■ Reduces metal contamination through special surface treatment ■ Capable of controlling a wide range of film properties ■ Abundant accumulated data ■ Compatible with tray transport *For more details, please refer to the PDF materials or feel free to contact us.

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  • CVD Equipment
  • CVD Equipment

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Custom-made production achievements: CVD equipment

Custom-made production achievements: CVD equipment

We have a track record of equipment such as 'plasma CVD systems for metal containers' and 'ICP-type MOCVD systems'!

We would like to introduce the custom manufacturing achievements of Japan Create Co., Ltd. regarding "CVD equipment." We have a track record that includes "Plasma CVD equipment for solar cells," "Plasma CVD equipment for three-dimensional objects," "Plasma CVD equipment for metal containers," and "ICP-type MOCVD equipment." Sample processing is being conducted using demo units. Please feel free to contact us if you have any inquiries. 【Manufacturing Achievements (Excerpt)】 ■ Plasma CVD equipment for solar cells ■ Plasma CVD equipment for three-dimensional objects ■ Research and development load-lock type plasma CVD equipment ■ Plasma CVD equipment for metal containers ■ Plasma CVD equipment for medical containers *For more details, please refer to the PDF materials or feel free to contact us.

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  • CVD Equipment
  • CVD Equipment

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DLI-CVD/DLI-ALD device "MC-100/MC-200"

DLI-CVD/DLI-ALD device "MC-100/MC-200"

The maximum film-forming temperature is 800°C! It can accommodate up to 4x DLI evaporators with the chamber heating mechanism.

The "MC-100/MC-200" is a DLI-CVD/DLI-ALD system with a stainless steel chamber. It supports substrates up to 200mm in diameter, with a maximum of 8 mass flow controllers for the "MC-100" and 6 for the "MC-200," and it can be equipped with a turbo pump. Please feel free to consult us when you need assistance. 【Features】 ■ Supports substrates up to 200mm in diameter ■ Maximum film deposition temperature: 800℃ ■ Capable of accommodating up to 4x DLI evaporators ■ Mass flow controllers: up to 8 ■ Stainless steel chamber *For more details, please refer to the PDF document or feel free to contact us.

  • CVD Equipment
  • CVD Equipment

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CVD equipment

CVD equipment

CVD equipment

●Features This device is a thin film fabrication apparatus using the CVD method, which supplies raw material gases (gases, liquids, solids) to the CVD reaction chamber, causing chemical reactions to occur in the gas phase or on the surface of the substrate material, and utilizing gas-phase reactions and surface reactions to deposit the desired thin film material onto the substrate. Methods for chemically activating the raw material gases (exciting them) include thermal, plasma, and optical (laser, ultraviolet, etc.), with corresponding devices such as thermal CVD, plasma CVD, and optical CVD.

  • Analytical Equipment and Devices
  • Other laboratory equipment and containers
  • CVD Equipment

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CVD device "Nano Carbon Deposition Device"

CVD device "Nano Carbon Deposition Device"

Three types of sedimentation devices are available! Please choose according to your needs.

We would like to introduce the "Nano Carbon Deposition Device" handled by Katagiri Engineering Co., Ltd. This product is a CVD device capable of synthesizing nano carbon materials. In addition to the "CND-050LP," we offer a large-area nano carbon deposition device, the "LCND-200," and a PN nano carbon deposition device, the "NCD-050W." You can choose according to your application. 【Features】 ■ Capable of synthesizing nano carbon materials ■ Three types in the lineup ■ Selectable based on application *For more details, please refer to the PDF document or feel free to contact us.

  • CVD Equipment
  • CVD Equipment

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